@prefix p: <http://www.wikidata.org/prop/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix schema1: <http://schema.org/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix wd: <http://www.wikidata.org/entity/> .
@prefix wds: <http://www.wikidata.org/entity/statement/> .
@prefix wdt: <http://www.wikidata.org/prop/direct/> .
@prefix wikibase: <http://wikiba.se/ontology#> .
@prefix xsd: <http://www.w3.org/2001/XMLSchema#> .

wd:Q1050797 rdfs:label "عملية 600 نانومتر"@ar,
        "600 nanòmetres"@ca,
        "600 nm lithography process"@en,
        "600-nanometra teknologio"@eo,
        "600 nanómetros"@es,
        "600 nm"@fr,
        "600 nm"@it,
        "600 nm 공정"@ko,
        "600 nāi-bí chè-têng"@nan,
        "600 nanômetros"@pt,
        "600 нанометров"@ru,
        "600-nanometrska litografija"@sl,
        "600 nm üretim süreci"@tr,
        "600 нанометрів"@uk,
        "600纳米制程"@wuu,
        "600納米製程"@yue,
        "600纳米制程"@zh,
        "600奈米製程"@zh-hant,
        "600納米製程"@zh-hk ;
    schema1:dateModified "2026-10-13T03:19:42+00:00"^^xsd:dateTime ;
    schema1:description "semiconductor manufacturing processes with a 600 nm MOSFET technology node"@en,
        "tecnología de proceso de la industria de los semiconductores"@es,
        "procédé de fabrication de semi-conducteurs"@fr,
        "processo produttivo della tecnologia dei semiconduttori"@it,
        "технология изготовления полупроводниковых схем"@ru ;
    schema1:version 2556446776 ;
    wikibase:identifiers 1 ;
    wikibase:sitelinks 13 ;
    wikibase:statements 5 ;
    skos:altLabel "عملية ٦٠٠ نانومتر"@ar,
        "600 nm"@ca,
        "0.6 μm"@en,
        "0.6-micrometre"@en,
        "0.6-micron"@en,
        "0.6μm"@en,
        "600 nm"@en,
        "600-nanometre process"@en,
        "600nm"@en,
        "Proceso de 600 nm"@es,
        "600 nanomètres"@fr,
        "0.6 µm"@ko,
        "0.6 µm 공정"@ko,
        "0.6 마이크로미터 공정"@ko,
        "0.60 µm"@ko,
        "0.60 마이크로미터 공정"@ko,
        "0.60µm"@ko,
        "0.6µm"@ko,
        "0.6µm 공정"@ko,
        "600 nm"@ko,
        "600 나노미터"@ko,
        "600 나노미터 공정"@ko,
        "600nm"@ko,
        "600 нм"@ru,
        "0,60 μm"@sl,
        "600 nanometrov"@sl,
        "600 nm"@sl ;
    p:P1343 wds:Q1050797-34CFA276-17A1-4618-9EC2-9AD9DE9418CA ;
    p:P155 wds:Q1050797-e2e17ff3-4116-f2c5-8e25-0237165342c2 ;
    p:P156 wds:Q1050797-49d6fcf5-478e-7cbd-915b-6c6431051b9d ;
    p:P279 wds:Q1050797-edc76a90-4048-4377-8768-9ed0a7664f13 ;
    p:P646 wds:Q1050797-FA2166B9-5689-4861-B70C-40D76BE77882 ;
    wdt:P1343 wd:Q1428079 ;
    wdt:P155 wd:Q1135952 ;
    wdt:P156 wd:Q1050761 ;
    wdt:P279 wd:Q622938 ;
    wdt:P646 "/m/02prn_4" .