@prefix p: <http://www.wikidata.org/prop/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix schema1: <http://schema.org/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix wd: <http://www.wikidata.org/entity/> .
@prefix wds: <http://www.wikidata.org/entity/statement/> .
@prefix wdt: <http://www.wikidata.org/prop/direct/> .
@prefix wikibase: <http://wikiba.se/ontology#> .
@prefix xsd: <http://www.w3.org/2001/XMLSchema#> .

wd:Q1135952 rdfs:label "عملية 800 نانومتر"@ar,
        "800 nanòmetres"@ca,
        "800 nm lithography process"@en,
        "800-nanometra teknologio"@eo,
        "800 nanómetros"@es,
        "800 nm"@fr,
        "800 nm"@it,
        "800 nm 공정"@ko,
        "800 nāi-bí chè-têng"@nan,
        "800 nanômetros"@pt,
        "800 нанометров"@ru,
        "800-nanometrska litografija"@sl,
        "800 nm üretim süreci"@tr,
        "800 нанометрів"@uk,
        "800纳米制程"@wuu,
        "800納米製程"@yue,
        "800纳米制程"@zh,
        "800奈米製程"@zh-hant,
        "800納米製程"@zh-hk ;
    schema1:dateModified "2026-10-13T03:19:44+00:00"^^xsd:dateTime ;
    schema1:description "semiconductor manufacturing processes with a 800 nm MOSFET technology node"@en,
        "tecnología de proceso de la industria de semiconductores"@es,
        "procédé de fabrication de semi-conducteurs"@fr,
        "processo produttivo della tecnologia dei semiconduttori"@it,
        "технология изготовления полупроводниковых схем"@ru ;
    schema1:version 2556446791 ;
    wikibase:identifiers 1 ;
    wikibase:sitelinks 12 ;
    wikibase:statements 5 ;
    skos:altLabel "عملية ٨٠٠ نانومتر"@ar,
        "0.8 μm"@en,
        "0.8-micrometre"@en,
        "0.8-micron"@en,
        "0.8μm"@en,
        "800 nanometre process"@en,
        "800 nm"@en,
        "800nm"@en,
        "Proceso de 800 nm"@es,
        "800 nanomètres"@fr,
        "0.8 µm"@ko,
        "0.8 µm 공정"@ko,
        "0.8 마이크로미터 공정"@ko,
        "0.80 µm"@ko,
        "0.80 마이크로미터 공정"@ko,
        "0.80µm"@ko,
        "0.8µm"@ko,
        "0.8µm 공정"@ko,
        "800 nm"@ko,
        "800 나노미터"@ko,
        "800 나노미터 공정"@ko,
        "800nm"@ko,
        "800 нм"@ru,
        "0,80 μm"@sl,
        "800 nanometrov"@sl,
        "800 nm"@sl ;
    p:P1343 wds:Q1135952-8AF3E760-6875-4EC0-B4E4-63E7D1D04897 ;
    p:P155 wds:Q1135952-f31f1de0-4861-1f27-ae83-f86f1c7df40d ;
    p:P156 wds:Q1135952-c5388977-4fdd-3155-a4bb-171fd48d3de6 ;
    p:P279 wds:Q1135952-f55a2544-41b4-0506-f290-aa3fc95f72af ;
    p:P646 wds:Q1135952-A26174AF-8363-403B-A80C-61D08A244FF8 ;
    wdt:P1343 wd:Q1428079 ;
    wdt:P155 wd:Q450855 ;
    wdt:P156 wd:Q1050797 ;
    wdt:P279 wd:Q622938 ;
    wdt:P646 "/m/02pr70z" .