@prefix p: <http://www.wikidata.org/prop/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix schema1: <http://schema.org/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix wd: <http://www.wikidata.org/entity/> .
@prefix wds: <http://www.wikidata.org/entity/statement/> .
@prefix wdt: <http://www.wikidata.org/prop/direct/> .
@prefix wikibase: <http://wikiba.se/ontology#> .
@prefix xsd: <http://www.w3.org/2001/XMLSchema#> .

wd:Q867398 rdfs:label "180 nanòmetres"@ca,
        "180 nm lithography process"@en,
        "180-nanometra teknologio"@eo,
        "180 nanómetros"@es,
        "180 nm"@fr,
        "180 nm"@it,
        "180 nm 공정"@ko,
        "180 nāi-bí chè-têng"@nan,
        "180 nanômetros"@pt,
        "180 нанометров"@ru,
        "180-nanometrska litografija"@sl,
        "180 nm üretim süreci"@tr,
        "180 нанометрів"@uk,
        "180纳米制程"@wuu,
        "180納米製程"@yue,
        "180纳米制程"@zh,
        "180奈米製程"@zh-hant,
        "180納米製程"@zh-hk ;
    schema1:dateModified "2026-10-13T03:19:36+00:00"^^xsd:dateTime ;
    schema1:description "semiconductor manufacturing processes with a 180 nm MOSFET technology node"@en,
        "tecnología proceso de semiconductores lanzada al mercado en 1999"@es,
        "procédé de fabrication de semi-conducteurs avec un MOSFET de 180 nm"@fr,
        "processo produttivo della tecnologia dei semiconduttori"@it,
        "технология изготовления полупроводниковых схем"@ru ;
    schema1:version 2556446730 ;
    wikibase:identifiers 1 ;
    wikibase:sitelinks 12 ;
    wikibase:statements 7 ;
    skos:altLabel "180 nm"@ca,
        "0.18 μm"@en,
        "0.18-micrometre"@en,
        "0.18-micron"@en,
        "0.18μm"@en,
        "180 nanometre"@en,
        "180 nm"@en,
        "180nm"@en,
        "Proceso de 180 nm"@es,
        "180 nanomètres"@fr,
        "0.18 µm"@ko,
        "0.18 µm 공정"@ko,
        "0.18 마이크로미터"@ko,
        "0.18 마이크로미터 공정"@ko,
        "0.18µm"@ko,
        "0.18µm 공정"@ko,
        "180 nm"@ko,
        "180 나노미터"@ko,
        "180 나노미터 공정"@ko,
        "180nm"@ko,
        "180nm 공정"@ko,
        "180 нм"@ru,
        "0,18 μm"@sl,
        "180 nanometrov"@sl,
        "180 nm"@sl ;
    p:P1343 wds:Q867398-8ADBEED4-E08A-4FA5-9A11-20659E4D6E21 ;
    p:P155 wds:Q867398-b71c87af-4f04-560a-29c0-6c9d8b9fdfee ;
    p:P156 wds:Q867398-0d5f7ee6-4dd2-7856-ac96-0dce58312505 ;
    p:P176 wds:Q867398-6f32eb1c-4fdc-fff6-0852-bcd43aaec977,
        wds:Q867398-f643292d-46b7-9aed-b548-494f667db4c4 ;
    p:P279 wds:Q867398-5001db19-4ba7-ecbc-34cc-29530b874db9 ;
    p:P646 wds:Q867398-148648D6-250D-4D97-B13A-349C8432C9FD ;
    wdt:P1343 wd:Q1428079 ;
    wdt:P155 wd:Q25991747 ;
    wdt:P156 wd:Q25991746 ;
    wdt:P176 wd:Q4310655,
        wd:Q691592 ;
    wdt:P279 wd:Q622938 ;
    wdt:P646 "/m/026wfnp" .