600 nm lithography process
semiconductor manufacturing processes with a 600 nm MOSFET technology node
| rdfs:label |
"600 nm lithography process"@en
|
|
skos:alt |
"0.6 μm"@en
"0.6-micrometre"@en
"0.6-micron"@en
"0.6μm"@en
"600 nm"@en
"600-nanometre process"@en
"600nm"@en
|
| schema:description |
"semiconductor manufacturing processes with a 600 nm MOSFET technology node"@en
|
|
schema:date |
"2026-10-13T03:19:42+00:00"^^xsd:dateTime |
| schema:version | 2556446776 |
| wikibase:identifiers | 1 |
| wikibase:sitelinks | 13 |
| wikibase:statements | 5 |
| p:P1343 | wd:statement/Q1050797-34CFA276-17A1-4618-9EC2-9AD9DE9418CA |
| p:P155 | wd:statement/Q1050797-e2e17ff3-4116-f2c5-8e25-0237165342c2 |
| p:P156 | wd:statement/Q1050797-49d6fcf5-478e-7cbd-915b-6c6431051b9d |
| p:P279 | wd:statement/Q1050797-edc76a90-4048-4377-8768-9ed0a7664f13 |
| p:P646 | wd:statement/Q1050797-FA2166B9-5689-4861-B70C-40D76BE77882 |
| wdt:P1343 | International Technology Roadmap for Semiconductors |
| wdt:P155 | 800 nm lithography process |
| wdt:P156 | 350 nm lithography process |
| wdt:P279 | photolithography |
| wdt:P646 | "/m/02prn_4" |
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