800 nm lithography process
semiconductor manufacturing processes with a 800 nm MOSFET technology node
| rdfs:label |
"800 nm lithography process"@en
|
|
skos:alt |
"0.8 μm"@en
"0.8-micrometre"@en
"0.8-micron"@en
"0.8μm"@en
"800 nanometre process"@en
"800 nm"@en
"800nm"@en
|
| schema:description |
"semiconductor manufacturing processes with a 800 nm MOSFET technology node"@en
|
|
schema:date |
"2026-10-13T03:19:44+00:00"^^xsd:dateTime |
| schema:version | 2556446791 |
| wikibase:identifiers | 1 |
| wikibase:sitelinks | 12 |
| wikibase:statements | 5 |
| p:P1343 | wd:statement/Q1135952-8AF3E760-6875-4EC0-B4E4-63E7D1D04897 |
| p:P155 | wd:statement/Q1135952-f31f1de0-4861-1f27-ae83-f86f1c7df40d |
| p:P156 | wd:statement/Q1135952-c5388977-4fdd-3155-a4bb-171fd48d3de6 |
| p:P279 | wd:statement/Q1135952-f55a2544-41b4-0506-f290-aa3fc95f72af |
| p:P646 | wd:statement/Q1135952-A26174AF-8363-403B-A80C-61D08A244FF8 |
| wdt:P1343 | International Technology Roadmap for Semiconductors |
| wdt:P155 | 1 µm lithography process |
| wdt:P156 | 600 nm lithography process |
| wdt:P279 | photolithography |
| wdt:P646 | "/m/02pr70z" |
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